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| IEI > Polymer Etching with Remote Source Magnetron > Enlarged | |
  0.7μm line/space in 4.0μm polyimide, lift-off profile | |
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|
IEI, Inc | Contact IEI |
|
|
| IEI > Polymer Etching with Remote Source Magnetron > Enlarged | |
|
0.7μm line/space in 4.0μm polyimide, lift-off profile | |
| BACK |
|
IEI, Inc | Contact IEI |